What is an advantage of the NanoMaker at exposure without blanker? If I were to buy the NanoMaker I would save on buying a beam blanker, but the same is true for your competitors - they can operate with or without beam blanker. So what is the advantage?
No one of competing systems have the dynamic compensation of the beam deflection system positioning error.
So, during the writing, when beam jumps to long distance, they have to blank the beam for certain time and stay at the beginning of the line before the beam will settle down.
They can't do this without the beam blanker otherwise the result of writing will be pitiable. Besides, because NanoMaker doesn't use settling times it operates much faster (up to 10 times).
This is applicable for SEMs with electro-magnetic beam deflection systems (most SEMs at the moment) when structure fits in one Writing Field.